Equal Line and Space patterns with varying frequencies and resulting pitch are standard images for multiple applications. Available as either Chrome on Glass or Etch and Filled on Glass, these Ronchi Rulings can be used to evaluate Vision, Optical and Metrology applications.
Pattern will qualify an image for resolution, Modulation Transfer Function (MTF), Depth of Field (DOF), and distortion. Used as a multiple knife-edge for testing a concave mirror in optics. Patterns useful in moire deflectometry, moire analysis, moire topography and more.
Microscopic metrology can use line displacement for direct measurements.