Coordinate Grid and Target Position Matrix used with Robotic Sensor and Optically Encoded Positional Control Systems as a positional feedback reference for autocalibration of the digital readout system.

CAD/CAM Layout and Inspection Standard: Precision grids up to 37” X 120” have been manufactured and built into Air Cooled, Lighted Inspection Boxes (shown at right) for calibrating photoplotters and controlling photomaster production.

Printed Circuit and Two Dimensional Tooling and Part Production: Ideal for inspection of P.C. Interlayer Registration, Flex Circuit, and Etched Metal Masks, Tooling and Parts. In the case of long run production parts, pin registered Go/No-Go Outline Targets can be made for very quick visual or machine vision inspection.

Coordinate/Measurement Grids for Cartography and Aerial Photography

When used in conjuction with our PRECISION MICRORULES or MICROSCALES, off grid targets and features can be measured within ±0.0002”.

SUBSTRATE MATERIAL OPTIONS: Grids and Large Targets are normally manufactured in 0.235” or thicker, flat, soda lime glass. Opal glass, film or metal are also available for custom applications. Grids and Targets may be patterned on one, two or up to six sides for Machine Vision applications.

In the Etch and Fill process, the pattern is etched into the substrate surface, and the lines filled with an extremely durable, opaque epoxy material.(See Bulletin 1100, "Substrate Processing") The Etch and Fill process is the preferred method for Grids and Targets where the substrate surface is a work surface; or the pattern must be non-specular. Non-target substrate areas that must be non-specular can be lightly frosted, backed up with a white plastic diffuser, or the substrate fabricated from opal glass.

For certain Viewing/Printing applications, where the pattern and substrate must be transparent under certain conditions, the pattern can be etched into the glass, and the edges of the glass ground and polished for edge lighting of the pattern for viewing/inspection. With the edge lighting off, the pattern is transparent.

For quantity manufacturing of Large Grids and Targets, a wrong reading master can be generated on the Autograph and used as a replication master in combination with a special scanning head that adapts to the Autograph. This allows us to produce fine line, near master quality contact replications without vacuum; therefore avoiding the substrate stress and subsequent loss of accuracy that is associated with vacuum frame printing.

PATTERN LINE TO LINE AND OVERALL ACCURACY: Line to line accuracy for small targets and grids generated by E-Beam technology can be as good as 0.1 microns, with overall accuracy of about 0.2 microns per inch for substrates up to 6” X 6”. The Autograph, when producing small geometries on very large substrates, has a line to line accuracy of better than ±0.0001” and an overall accuracy of ±0.0001”/foot. This translates to the following corner to corner accuracy:

COMPOSITE GRIDS, TARGETS, ENCODERS AND MICROSCALE PATTERNS: The designer of Machine Vision and Metrology Targets and Grids can incorporate into one pattern, resolution rulings and targets, (such as the 1951 AF Resolution Target,) absolute and/or incremental encoder tracks, various grid and dot patterns, line numbering, and any one of our MICROSCALE or MICRORULE patterns.

Composite pattern material options, combining the features of hard chrome, low reflection hard chrome, etch and fill, or edge lighting are also viable design options.

Company logos, part numbers, and other unique features specific to the designer's application can also be incorporated to provide a custom OEM product.

N.I.S.T. TRACABLE CALIBRATION: Large Grids and Targets can be effectivaly calibrated using our Autograph and a special, very high magnification closed circuit TV system. This system meets the requirements of MIL-STD-45662A (Calibration System Requirements) For a complete description of this calibration procedure, request ITP-1001.